Fabrication of phase masks from amorphous carbon thin films for electron-beam shaping

• Lukas Grünewald,
• Dagmar Gerthsen and
• Simon Hettler

Beilstein J. Nanotechnol. 2019, 10, 1290–1302, doi:10.3762/bjnano.10.128

• Lukas Grunewald Dagmar Gerthsen Simon Hettler Laboratory for Electron Microscopy, Karlsruhe Institute of Technology (KIT), Engesserstrasse 7, 76131 Karlsruhe, Germany 10.3762/bjnano.10.128 Abstract Background: Electron-beam shaping opens up the possibility for novel imaging techniques in scanning

• ; Bessel beam; electron-beam shaping; nanofabrication; vortex beam; Introduction The possibility to shape electron beams has gained much interest since the first observation of electron vortex beams, i.e., beams that carry a defined orbital angular momentum [1][2][3]. Various other beam shapes, e.g., non

• modern (aberration-corrected) microscopes [11]. A range of different techniques has been developed to experimentally realize electron-beam shaping [12]. For example, special slit apertures [6][7] or nanoscale amplitude holograms [3] block specific parts of the incoming electron wave and generate the